On X-ray diffraction study of microstructure of ZnO thin nanocrystalline films with strong preferred grain orientation

0396259 - FZÚ 2014 RIV US eng J - Článek v odborném periodiku
Kužel, R. - Čížek, J. - Novotný, Michal
On X-ray diffraction study of microstructure of ZnO thin nanocrystalline films with strong preferred grain orientation.
Metallurgical and Materials Transactions A. 44A, č. 1 (2013), s. 45-57. ISSN 1073-5623. E-ISSN 1543-1940
Grant CEP: GA ČR(CZ) GAP108/11/0958
Institucionální podpora: RVO:68378271
Klíčová slova: zinc oxide thin film * X-ray diffraction * Mg0 * fused silica
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus
Impakt faktor: 1.730, rok: 2013

Textures, stresses, and strains, as well as the overall so-called real structure, are crucial for properties of thin films deposited by different methods and can have both positive and negative effects depending on the film and its application. They were studied by a combination of different X-ray diffraction (XRD) techniques for several ZnO films. The films prepared by pulsed laser deposition (PLD) on MgO and sapphire single-crystalline substrates and amorphous-fused silica showed different kinds of strong preferred orientation and also different stresses that could be estimated only from the analysis of quite narrow, nonzero intensity regions of diffraction spots. XRD line broadening was analyzed by a combination of different asymmetric scans. Fiber (0001) texture and tensile residual stresses were found on fused silica, while domains with local epitaxy and huge compressive ...
Trvalý link: http://hdl.handle.net/11104/0224096