In-situ monitoring of the growth of nanostructured aluminum thin film

0361263 - FZÚ 2013 RIV US eng J - Článek v odborném periodiku
Novotný, Michal - Bulíř, Jiří - Lančok, Ján - Pokorný, Petr - Bodnár, Michal
In-situ monitoring of the growth of nanostructured aluminum thin film.
Journal of Nanophotonics. Roč. 5, č. 5 (2011), "051503-1"-"051503-10". ISSN 1934-2608
Grant CEP: GA AV ČR IAA100100718; GA AV ČR IAA100100729; GA ČR GP202/09/P324
Výzkumný záměr: CEZ:AV0Z10100522
Klíčová slova: aluminum ultrathin film * magnetron sputtering * in-situ monitoring * electrical conductivity * spectral ellipsometry * optical emission spectroscopy
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus
Impakt faktor: 1.570, rok: 2011

In order to control the nanostructure of aluminum thin films fabricated by RF magnetron sputtering, we made use of in-situ monitoring of electrical and optical properties of the growing layer as well as plasma characterization by mass and optical emission spectroscopy. The electrical conductivity and I-V characteristics were measured. The optical constants were obtained from optical monitoring based on spectral ellipsometry. The relevant models (based on one or two Lorentz oscillators and B-spline functions) were suggested to evaluate the data obtained from themonitoring techniques. The results of the in-situ monitoring were correlated with scanning electron microscope analyses. The nanostructure was effectively manipulated by RF power variation. Optical functions exhibiting plasmonic behavior in the UV range and a strong nonlinear character of I-V curves were obtained for an ultrathin Al film deposited at a lower growth rate.
Trvalý link: http://hdl.handle.net/11104/0198619