InAs/GaAs quantum dot capping in kinetically limited MOVPE growth regime

0359526 - FZÚ 2012 RIV NL eng J - Článek v odborném periodiku
Hospodková, Alice - Pangrác, Jiří - Vyskočil, Jan - Oswald, Jiří - Vetushka, Aliaksi - Caha, O. - Hazdra, P. - Kuldová, Karla - Hulicius, Eduard
InAs/GaAs quantum dot capping in kinetically limited MOVPE growth regime.
Journal of Crystal Growth. Roč. 317, č. 1 (2011), s. 39-42. ISSN 0022-0248. E-ISSN 1873-5002
Grant CEP: GA ČR GAP102/10/1201; GA ČR GAP108/10/0253; GA MŠMT LC510; GA ČR GA202/09/0676
Výzkumný záměr: CEZ:AV0Z10100521
Klíčová slova: low dimensional structures * photoluminescence * low-pressure MOVPE * InAs/GaAs quantum dots * semiconducting III–V materials
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus
Impakt faktor: 1.726, rok: 2011

InAs/GaAs quantum dot(QD)properties can be significantly influenced by the growth conditions of the QD capping layer. We have studied the effect of a group III partial pressure in the reactor on the QD capping process and on the QD photoluminescence when the capping layer is grow nunder the kinetically limited regime. Two types of capping layers were prepared: GaAs and InGaAs. The GaAs capping layer growth rate decrease did not influence QD dissolution, but increased the dissolution of big hillocks. Influence of the GaAs capping layer thickness on QD photoluminescence is also demonstrated. The composition of the ternary strain reducing InGaAs capping layer can beconsiderably changed depending on the V/III ratio under kinetically limited growth.
Trvalý link: http://hdl.handle.net/11104/0197302