Laser source for interferometry in nanotechnology

0352207 - ÚPT 2011 RIV US eng C - Konferenční příspěvek (zahraniční konf.)
Hrabina, Jan - Lazar, Josef - Číp, Ondřej - Čížek, Martin
Laser source for interferometry in nanotechnology.
17th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics (Proceedings of SPIE Vol. 7746). Bellingham: SPIE, 2010, 77461I: 1-6. ISBN 978-0-8194-8236-5.
[Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics /17./. Liptovsky Jan (SK), 06.09.2010]
Grant CEP: GA MŠMT(CZ) LC06007; GA MŠMT 2C06012; GA MPO 2A-1TP1/127; GA MPO FT-TA3/133; GA MPO 2A-3TP1/113; GA ČR GA102/09/1276; GA ČR GA102/07/1179
Výzkumný záměr: CEZ:AV0Z20650511
Klíčová slova: atomic force microscopy * nanometrology * interferometry
Kód oboru RIV: BH - Optika, masery a lasery

The contribution is oriented towards measuring in the nanoscale through local probe microscopy techniques, primarily the AFM microscopy. The need to make the AFM microscope a nanometrology tool not only the positioning of the tip has to be based on precise measurements but the traceability of the measuring technique has to be ensured up to the primary etalon. This leads to the engagement of laser interferometric measuring methods. We present a design of a single-frequency stabilized laser which serves as a laser source for multiaxis position control of a nanopositioning stage. The laser stabilization technique is described together with comparison of frequency stability.
Trvalý link: http://hdl.handle.net/11104/0191774