Physical and photocatalytic properties of laser fabricated crystalline TiO.sub.2./sub. at low temperatures

0349017 - FZÚ 2012 RIV RO eng J - Článek v odborném periodiku
Remsa, Jan - Jelínek, M. - Kocourek, T. - Mikšovský, J. - Studnička, Václav - Vorlíček, Vladimír - Sváta, V. - Vymětalová, V.
Physical and photocatalytic properties of laser fabricated crystalline TiO₂ at low temperatures.
Journal of Optoelectronics and Advanced Materials. Roč. 12, č. 3 (2010), s. 754-757. ISSN 1454-4164. E-ISSN 1841-7132
Výzkumný záměr: CEZ:AV0Z10100522
Klíčová slova: pulsed laser deposition * TiO₂ * contact angle * photocatalytic properties * thin films
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus
Impakt faktor: 0.412, rok: 2010

We report on an extensive study of the deposition of titanium dioxide layers by pulsed laser deposition at either room temperature or at 200°C (300°C, 400°C, 500°C) from pure titanium and titanium dioxide targets. Some amorphous samples were annealed by the rapid thermal annealing method. The study is focused on the effect of variation of pressure of the reactive oxygen and the inert argon atmospheres, and the mixtures of both. The laser fluency varied in the range 2 J/cm2 to 9 J/cm2. The crystalline structure was characterized by X-ray diffraction and Raman Spectroscopy and for the study of the surface properties, atomic force microscopy was used. The TiO2 photocatalytic characteristics were determined using 4-chlorphenol solution degradation evaluated by pH measurement. Polycrystalline (anatase, rutile, and brookite) and amorphous layers exhibiting photocatalytic behavior were obtained at low substrate temperatures (200°C).
Trvalý link: http://hdl.handle.net/11104/0006069