Double hollow cathode plasma jet-low temperature method for the TiO.sub.2-x./sub.N.sub.x./sub. photoresponding films

0346487 - FZÚ 2011 RIV GB eng J - Článek v odborném periodiku
Kment, Štěpán - Klusoň, Petr - Hubička, Zdeněk - Krýsa, J. - Čada, Martin - Gregora, Ivan - Deyneka, Alexander - Remeš, Zdeněk - Žabová, Hana - Jastrabík, Lubomír
Double hollow cathode plasma jet-low temperature method for the TiO_2-xN_x photoresponding films.
Electrochimica acta. Roč. 55, č. 5 (2010), s. 1548-1556. ISSN 0013-4686. E-ISSN 1873-3859
Grant CEP: GA AV ČR KAN301370701; GA AV ČR KJB100100805; GA AV ČR KAN400720701; GA ČR GA202/09/0800; GA AV ČR KJB100100703
Výzkumný záměr: CEZ:AV0Z10100522; CEZ:AV0Z40720504
Klíčová slova: TiO * plasma jets
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus
Impakt faktor: 3.642, rok: 2010

The low temperature double hollow cathode plasma jet method for producing photoresponding thin transparent layers of TiO_2-xN_x is reported. The RF power magnitude was identified as the parameter affecting substantially the photoinduced properties of the produced films.
Trvalý link: http://hdl.handle.net/11104/0187508