Self-Assembly of Symmetric Diblock Copolymers in Planar Slits with and without Nanopatterns: Insight from Dissipative Particle Dynamics Simulations

0339615 - ÚCHP 2010 RIV US eng J - Článek v odborném periodiku
Petrus, P. - Lísal, Martin - Brennan, J.K.
Self-Assembly of Symmetric Diblock Copolymers in Planar Slits with and without Nanopatterns: Insight from Dissipative Particle Dynamics Simulations.
Langmuir. Roč. 26, č. 5 (2010), s. 3695-3709. ISSN 0743-7463
Grant CEP: GA ČR GA203/08/0094; GA AV ČR 1ET400720507; GA AV ČR KAN400720701
Grant ostatní: FP(XE) COST TD0802; FP(XE) MULTIPRO 033304
Výzkumný záměr: CEZ:AV0Z40720504
Klíčová slova: diblock copolymer * dissipative particle dynamics * nanopatterned confinement
Kód oboru RIV: CF - Fyzikální chemie a teoretická chemie
Impakt faktor: 4.269, rok: 2010

We present a dissipative particle dynamics simulation study on the formation of nanostructures of symmetric diblock copolymers confined between planar surfaces with and without nanopatterns. The nanopatterned surface is mimicked by alternating portions of the surface that interact differently with the diblock copolymers. The formation of the diblock-copolymer nanostructures confined between the planar surfaces is investigated and characterized by varying the separation width and the strength of the interaction between the surfaces and the diblock copolymers.
Trvalý link: http://hdl.handle.net/11104/0005743