Measurement of total energy flux density at a substrate during TiO.sub.x./sub. thin film deposition by using a plasma jet system

0334316 - FZÚ 2010 RIV GB eng J - Článek v odborném periodiku
Čada, Martin - Virostko, Petr - Kment, Štěpán - Hubička, Zdeněk
Measurement of total energy flux density at a substrate during TiO_x thin film deposition by using a plasma jet system.
Vacuum. Roč. 83, č. 4 (2009), s. 738-744. ISSN 0042-207X. E-ISSN 1879-2715
Grant CEP: GA AV ČR KJB100100707; GA AV ČR KAN301370701
Výzkumný záměr: CEZ:AV0Z10100522
Klíčová slova: hollow cathode * plasma jet * sputtering * pulsed DC * energy influx on substrate * TiO₂
Kód oboru RIV: BL - Fyzika plazmatu a výboje v plynech
Impakt faktor: 0.975, rok: 2009
http://www.sciencedirect.com/science?_ob=ArticleURL&_udi=B6TW4-4SJ2WRT-2&_user=625012&_rdoc=1&_fmt=&_orig=search&_sort=d&view=c&_acct=C000031722&_vers

The total energy flux density delivered to an electrically isolated substrate in a low-pressure pulsed DC hollow cathode plasma jet sputtering system during TiO2 thin film deposition has been quantified. The plasma source was operated in constant average current mode and in a mixture of argon and oxygen or only in pure argon working gas. A titanium nozzle served as the hollow cathode. The total energy flux density measurements were made using a planar calorimeter probe. The main results from the calorimeter probe showed clearly that the total energy flux density at the electrically isolated substrate decreases significantly with duty cycle from 100% (DC mode) to 10% at a given pulsing frequency 2.5 kHz.
Trvalý link: http://hdl.handle.net/11104/0179088