0183956 - UJF-V 970060 RIV DE eng J - Článek v odborném periodiku
Odzhaev, V. B. - Popok, V. N. - Prosolovich, V. S. - Hnatowicz, Vladimír
Boron electrical activation in dual B+N and B+Ar ion-implanted Si.
Applied Physics A - Materials Science & Processing. Roč. 62, - (1996), s. 355-358. ISSN 0947-8396. E-ISSN 1432-0630
Grant CEP: GA AV ČR KSK1010601
Trvalý link: http://hdl.handle.net/11104/0001999