0134652 - FZU-D 20030552 RIV NL eng J - Článek v odborném periodiku
Bálková, R. - Zemek, Josef - Čech, V. - Vaněk, J. - Přikryl, R.
XPS study of siloxane plasma polymer films.
Surface and Coatings Technology. 174-175, - (2003), s. 1159-1163. ISSN 0257-8972. E-ISSN 1879-3347
Grant CEP: GA ČR GA104/00/0708; GA MŠMT OC 527.110
Výzkumný záměr: CEZ:AV0Z1010914
Klíčová slova: radio frequency(RF) * X-ray photoelectron spectroscopy(XPS) * electron spectroscopy for chemical analysis(ESCA)
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus
Impakt faktor: 1.410, rok: 2003

The composition of elements in the surface region (top 6-8 nm) of the deposited films was studied by X-ray-induced photoelectron spectroscopy(XPS) on an ADES 400 VG Scientific photoelectron spectrometer using MgK_ŕ(1253.6 eV) or AlK_ŕ (1486.6 eV) photon beams at the normal emiaaion angle.
Trvalý link: http://hdl.handle.net/11104/0032546