0134519 - FZU-D 20030419 RIV NL eng J - Článek v odborném periodiku
Torrisi, L. - Gammino, S. - Mezzasalma, A. M. - Badziak, J. - Parys, P. - Wolowski, J. - Woryna, E. - Krása, Josef - Láska, Leoš - Pfeifer, Miroslav - Rohlena, Karel - Boody, F. P.
Implantation of ions produced by the use of high power iodine laser.
Applied Surface Science. Roč. 217, 1-4 (2003), s. 319-331. ISSN 0169-4332. E-ISSN 1873-5584
Grant CEP: GA MŠMT LN00A100
Grant ostatní: HPRI(XE) CT-1999-00053
Výzkumný záměr: CEZ:AV0Z1010921
Klíčová slova: laser plasma * laser ablation * ion implantation * time-of-flight
Kód oboru RIV: BH - Optika, masery a lasery
Impakt faktor: 1.284, rok: 2003

The iodine power laser, emitting radiation at 438 nm wavelength (3rd-harmonic of a fundamental wavelwngth 1315 nm), was employed to irradiate in vacuum different metallic targets (Cu,Ag and Ta). The high energy (up to 230J) short(400 ps) laser pulses produce non-equilibrium plasma expanding mainly along the normal to the target surface.
Trvalý link: http://hdl.handle.net/11104/0000691