0134350 - FZU-D 20030248 RIV NL eng J - Článek v odborném periodiku
Bulíř, Jiří - Novotný, Michal - Jelínek, Miroslav - Jastrabík, Lubomír - Zelinger, Zdeněk
Study of plasma processes during pulsed laser ablation of graphite target in nitrogen.
Surface and Coatings Technology. 173-174, - (2003), s. 968-972. ISSN 0257-8972. E-ISSN 1879-3347
Grant CEP: GA AV ČR IAA1010110; GA ČR GP106/02/P015; GA MŠMT LN00A015
Výzkumný záměr: CEZ:AV0Z4040901; CEZ:AV0Z1010914
Klíčová slova: plasma processes * laser deposition * emission spectroscopy
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus
Impakt faktor: 1.410, rok: 2003

Plasma processes during CN_x films deposition were studied in a pulsed laser deposition system equipped with a KrF excimer laser (500mJ, 20ns). We report on an optical emission spectroscopy, which was used for a spatial and time resolved investigation of the plasma species. Analysis includes estimation of vibrational and rotational temperatures of the CN molecule.
Trvalý link: http://hdl.handle.net/11104/0032255