0133933 - FZU-D 20020217 RIV CH eng J - Článek v odborném periodiku
Bulíř, Jiří - Novotný, Michal - Jelínek, Miroslav - Lančok, Ján - Zelinger, Zdeněk - Trchová, M.
Pulsed laser deposition of CN_x films: role of r.f. nitrogen plasma activation for the film structure formation.
Diamond and Related Materials. Roč. 11, - (2002), s. 1223-1226. ISSN 0925-9635. E-ISSN 1879-0062
Grant CEP: GA MŠMT LN00A015
Grant ostatní: -(XC) INCO/COPRNICUS/IC 15CT 960757
Výzkumný záměr: CEZ:AV0Z1010914
Klíčová slova: laser * CN_x * radio frequency (r.f.)
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus
Impakt faktor: 1.734, rok: 2002

Thin CN_x films were deposited by pulsed laser deposition equipped with KrF excimer laser. An additional radio-frequemcy discharge of the nitrogen gas was appled.The role of atomic nitrogen in CN radical formation was studied using emission spectroscopy. The composition of the films was measured by WDX. The N/C ratio of all films was approximately 1 and did not vary with N pressure.
Trvalý link: http://hdl.handle.net/11104/0031881