0133845 - FZU-D 20020024 RIV GB eng J - Článek v odborném periodiku
Jelínek, Miroslav - Kulish, W. - Lančok, Ján - Popov, C. - Bulíř, Jiří - Delplancke-Ogletree, M. P.
Nitrogen rich carbon nitride thin films deposited by hybrid PLD technique.
Molecular Crystals and Liquid Crystals. Roč. 374, - (2002), s. 207-210. ISSN 1058-725X
Výzkumný záměr: CEZ:AV0Z1010914
Klíčová slova: laser deposition * carbon nitride * radiofrequency discharge * hollow cathode discharge
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus
Impakt faktor: 0.457, rok: 2002

Highly nitrogenated CN_x films were created by pulsed laser deposition, combined with radiofrequency and hollow cathode discharges. The N/C ratio higher than 1 was measured. Deposition set- up and results of optical measurement are discussed.
Trvalý link: http://hdl.handle.net/11104/0031800