0133320 - FZU-D 20010115 RIV NL eng J - Článek v odborném periodiku
Kulisch, W. - Popov, C. - Zambov, L. M. - Bulíř, Jiří - Delplancke-Ogletree, M. P. - Lančok, Ján - Jelínek, Miroslav
Investigation of the thermal stability of nitrogen-rich amorphous carbon nitride films.
Thin Solid Films. 377-378, - (2000), s. 148-155. ISSN 0040-6090. E-ISSN 1879-2731
Výzkumný záměr: CEZ:AV0Z1010914
Klíčová slova: carbon nitride * annealing * pulsed laser deposition * inductively coupled plasma chemical vapour deposition
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus
Impakt faktor: 1.160, rok: 2000

The thermal stability of nitrogen-rich amorphous carbon nitride films is investigated from room temperature up to 600oC. The films were deposited by three different methods,namely pulsed laser deposition,inductively coupled plasma chemical capour deposition with gaseous precursors and ICP-CVD utilizing transport reactions.
Trvalý link: http://hdl.handle.net/11104/0031297