0132805 - FZU-D 20000057 RIV CH eng J - Článek v odborném periodiku
Shaginyan, L. R. - Fendrych, František - Jastrabík, Lubomír - Soukup, Ladislav - Kulikovsky, V. Yu. - Musil, Jindřich
CN_xH_y films obtained by ECR plasma activated CVD: the role of substrate bias (DC, RF) and some other deposition parameters in growth mechanism.
Surface and Coatings Technology. 116/119, - (1999), s. 65-73. ISSN 0257-8972. E-ISSN 1879-3347
Grant CEP: GA AV ČR IAA1010827
Výzkumný záměr: CEZ:AV0Z1010914
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus
Impakt faktor: 1.008, rok: 1999

The composition, optical and mechanical propertiesf the CNxHy films deposited at various process conditions were investigated by electron microprobe analysis, IR spectroscopy and microhardness measurements.
Trvalý link: http://hdl.handle.net/11104/0030804