0132073 - FZU-D 980320 RIV JP eng J - Článek v odborném periodiku
Mišina, Martin - Setsuhara, Y. - Miyake, S.
Ion assisted deposition of crystalline TiNi thin films by electron cyclotron resonance plasma enhanced sputtering.
Japanese Journal of Applied Physics. Roč. 36, 6A (1997), s. 3629-3634. ISSN 0021-4922. E-ISSN 1347-4065
Impakt faktor: 1.261, rok: 1997
Trvalý link: http://hdl.handle.net/11104/0030111