Počet záznamů: 1
Fabrication and characterization of diamond nanoparticles with optically active Si-V colour centres
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SYSNO ASEP 0486985 Druh ASEP A - Abstrakt Zařazení RIV O - Ostatní Název Fabrication and characterization of diamond nanoparticles with optically active Si-V colour centres Tvůrce(i) Potocký, Štěpán (FZU-D) RID, ORCID
Dragounová, Kateřina (FZU-D) ORCID
Kromka, Alexander (FZU-D) RID, ORCID, SAICelkový počet autorů 3 Zdroj.dok. 2nd International Conference on Applied Surface Science (ICASS). - Dalian, 2017 / Rudolph H. - ISSN 0169-4332 Poč.str. 1 s. Forma vydání Online - E Akce International Conference on Applied Surface Science (ICASS) /2./ Datum konání 12.06.2017 - 15.06.2017 Místo konání Dalian Země CN - Čína Typ akce WRD Jazyk dok. eng - angličtina Země vyd. CN - Čína Klíč. slova nanodiamond ; SEM Vědní obor RIV BM - Fyzika pevných látek a magnetismus Obor OECD Condensed matter physics (including formerly solid state physics, supercond.) CEP LD15003 GA MŠMT - Ministerstvo školství, mládeže a tělovýchovy Institucionální podpora FZU-D - RVO:68378271 Anotace Negatively charged Si vacancy centres in D have stable PL in the near infrared spectral range (738 nm) which exhibits a very narrow spectral bandwidth. Nanodiamonds with controllable size and surface properties are mandatory for their using in intracellular labelling. We present the fabrication and characterization of individual NDs with Si-V centres prepared from D thin films. Ultrasonication or BASD technique are used to postprocess the D films into NPs of two size distributions, i.e. diameters <100 and 200 nm. The influence of poly- and nanocrystalline film character on NP fabrication and their properties is studied by SEM and PL. We investigate the influence of particle surface termination on their PL properties. Hydrogen termination is provided in H plasma or H atmosphere at elevated temperatures. Oxygen termination is done by air annealing. Finally, Si-V room temperature PL properties of NPs is correlated with their quality (Raman), size distribution and zeta potential.
Pracoviště Fyzikální ústav Kontakt Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Rok sběru 2018 Elektronická adresa https://www.elsevier.com/events/conferences/international-conference-on-applied-surface-science/programme
Počet záznamů: 1